Dual-growth chamber Molecular Beam Epitaxy System (2 Lots)
UNIVERSITY OF SHEFFIELD · £250,000 – £4,750,000 · closes 14 Mar 2025
£250,000 – £4,750,000
Estimated value
Closed
Deadline
7 Feb 2025
Published
Awarded
Awarded 3 September 2025
This tender has closed.
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About this contract
The EPSRC National Epitaxy Facility (NEF) based at the University of Sheffield has been providing bespoke semiconductor wafers to academia and industry for 45 years. It is a unique world-class centre combining technical excellence and expertise with state-of-the-art epitaxy and material characterization equipment. We are looking to further enhance our capability provision to the UK semiconductor community, by investing in a new linked dual-chamber Molecular Beam Epitaxy (MBE) System for arsenides/phosphides and arsenides/antimonides growth that is fully automated, capable of 24/7 operation, reliable, and resource-efficient allowing further expansion in the future. The system is replacing two existing VG reactors capable of 4" wafer growth of high-quality arsenides/phosphides and arsenides/antimonides, and should offer higher throughput thanks to automation of growth recipes for 24/7 operation, and integrated solutions allowing maintenance of critical components (such as ion gauges, cells) without breaking chamber vacuum. This tender is divided into 2 Lots: (Suppliers may bid for one or both Lots) Lot 1 - MBE System Lot 2 - In-situ monitoring equipment Additional information: All tender documents, technical enquiries & tender returns, must be conducted via the In-tend portal, via the link shown above
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